Deposition mask, producing method therefor and forming method for thin film pattern

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United States of America Patent

PATENT NO 9555433
SERIAL NO

15071116

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Abstract

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A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.

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Patent Owner(s)

Patent OwnerAddress
V TECHNOLOGY CO LTDYOKOHAMA JAPAN'S KANAGAWA PREFECTURE IN HODOGAYA DISTRICT OF KOBE 134 YOKOHAMA-SHI KANAGAWA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aziz, Hany Maher Oakville, CA 8 63
Kajiyama, Koichi Yokohama, JP 49 408
Kajiyama, Yoshitaka Waterloo, CA 17 78
Kimura, Eriko Yokohama, JP 8 71
Kudo, Syuji Yokohama, JP 6 71
Mizumura, Michinobu Yokohama, JP 113 613
Sugimoto, Shigeto Yokohama, JP 4 54

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