Substrate processing device and substrate processing method
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United States of America Patent
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Jan 24, 2017
Grant Date -
Sep 18, 2014
app pub date -
Mar 14, 2014
filing date -
Mar 18, 2013
priority date (Note) -
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Abstract
In a substrate processing device 10 having a heating and drying unit 103 for drying a surface of a substrate W, the heating and drying unit 103 heats upward a vertically downward surface of the substrate W to dry the surface of the substrate by dropping and removing, by gravity, the droplets of the volatile solvent formed on the surface of the substrate W by the heating operation.
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