Simultaneous measurement of multiple overlay errors using diffraction based overlay
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United States of America Patent
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Jan 17, 2017
Grant Date -
Oct 29, 2015
app pub date -
Apr 13, 2015
filing date -
Dec 27, 2010
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Abstract
A plurality of overlay errors in a structure is determined using a target that includes a plurality of diffraction based overlay pads. Each diffraction based overlay pad has the same number of periodic patterns as the structure under test. Additionally, each diffraction based overlay pad includes a programmed shift between each pair of periodic patterns. The pads are illuminated and the resulting light is detected and used to simultaneously determine the plurality of overlay errors in the structure based on the programmed shifts. The overlay errors may be determined using a subset of elements of the Mueller matrix or by using the resulting spectra from the pads.
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