High-temperature process improvements using helium under regulated pressure
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United States of America Patent
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Jan 17, 2017
Grant Date -
Mar 3, 2011
app pub date -
Sep 1, 2010
filing date -
Sep 2, 2009
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Abstract
A method for minimizing unwanted ancillary reactions in a vacuum furnace used to process a material, such as growing a crystal. The process is conducted in a furnace chamber environment in which helium is admitted to the furnace chamber at a flow rate to flush out impurities and at a predetermined pressure to achieve thermal stability in a heat zone, to minimize heat flow variations and to minimize temperature gradients in the heat zone. During cooldown helium pressure is used to reduce thermal gradients in order to increase cooldown rates.
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