Photomask blank
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United States of America Patent
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Jan 10, 2017
Grant Date -
Jun 11, 2015
app pub date -
Dec 5, 2014
filing date -
Dec 6, 2013
priority date (Note) -
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Abstract
A photomask blank comprising a transparent substrate and a chromium-containing film deposited thereon is provided. The chromium-containing film comprises at least one CrC compound layer comprising up to 50 at % of Cr, at least 25 at % of O and/or N, and at least 5 at % of C. From the blank, a photomask having a photomask pattern formed on the substrate is produced, the photomask being used in photolithography of forming a resist pattern with a line width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm.
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