Method and apparatus for beam deflection in a gas cluster ion beam system
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United States of America Patent
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Jan 10, 2017
Issued Date -
N/A
app pub date -
Apr 24, 2015
filing date -
May 14, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.
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International Classification(s)
- 2015 Application Filing Year
- C23C Class
- 3009 Applications Filed
- 2118 Patents Issued To-Date
- 70.39 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C23C Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 10, 2028 |
