Dual beamsplitting element based excimer laser pulse stretching device

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United States of America Patent

PATENT NO 9537280
APP PUB NO 20160126690A1
SERIAL NO

14925197

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Abstract

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The present invention discloses a dual beamsplitting element based excimer laser pulse stretching device comprising two beam splitting elements and one confocal resonator. The first beamsplitting element splits incident laser beam into two beams, one beam enters the confocal resonator, generates a certain time delay and then is incident on the second beamsplitting element, and the second beam is directly incident on the second beamsplitting element. The second beamsplitting element further splits each of the incident laser beams into two beams, one of the two beams enters the confocal resonator, generates a certain time delay and is returned back to the first beamsplitting element to be further split, and the other of the two beams is combined with other beams which are direct outputs after being split by the beamsplitting elements or being optically delayed by the confocal resonator to form a stretched output beam. The present invention may effectively enhance the efficiency of the pulse stretching, decrease the peak power of the stretched beam, and increase the lifetime of optical elements used in the excimer laser photolithography systems.

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Patent Owner(s)

Patent OwnerAddress
THE INSTITUTE OF OPTICS AND ELECTRONICS THE CHINESE ACADEMY OF SCIENCESP O BOX 350 SHUANGLIU CHENGDU SICHUAN 610209

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Yanling Sichuan, CN 148 492
Li, Bincheng Sichuan, CN 4 25
Wang, Qiang Sichuan, CN 762 5596

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