Plasma generating device, method of controlling the same, and substrate processing device including the plasma generating device
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United States of America Patent
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Jan 3, 2017
Grant Date -
Oct 30, 2014
app pub date -
Mar 27, 2014
filing date -
Apr 25, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a plasma generating device. The plasma generating device includes: an RF power supply providing an RF signal; a plasma chamber providing a space where gas is injected to generate plasma; a first electromagnetic inducer installed at one portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a second electromagnetic inducer installed at another portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a first load connected to the first electromagnetic inducer; a second load connected to the second electromagnetic inducer; and a controller controlling a power supplied to the first electromagnetic inducer and the second electromagnetic inducer by adjusting at least one impedance of the first load and the second load.
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