Cleaning method for thin-film processing applications and apparatus for use therein

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United States of America Patent

PATENT NO 9534294
APP PUB NO 20150020847A1
SERIAL NO

13965968

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Abstract

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According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hein, Stefan Blankenbach, DE 51 329
Lorenz, Stefan Karlstein, DE 33 107
Morrison, Neil Darmstadt, DE 34 154
Ries, Florian Westerngrund, DE 24 104
Stolley, Tobias Oberursel, DE 24 76

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