Method for forming dense silicic film
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United States of America Patent
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Jan 3, 2017
Grant Date -
Sep 10, 2015
app pub date -
Oct 9, 2013
filing date -
Oct 11, 2012
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Abstract
The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.
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