Resist underlayer film-forming composition
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United States of America Patent
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Jan 3, 2017
Grant Date -
Nov 26, 2015
app pub date -
Dec 17, 2013
filing date -
Jan 9, 2013
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Abstract
There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately.
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