Ceramic heater and method for producing the same
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United States of America Patent
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Jan 3, 2017
Grant Date -
Sep 25, 2014
app pub date -
Mar 13, 2014
filing date -
Mar 21, 2013
priority date (Note) -
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Abstract
An electrostatic chuck 10 includes a disc-shaped alumina ceramic base 12, and a heater electrode 14 and an electrostatic electrode 16 that are embedded in the alumina ceramic base 12. An upper surface of the alumina ceramic base 12 functions as a wafer-receiving surface 12a. The heater electrode 14 is formed in a pattern shape, for example, in the manner of a single brush stroke so as to be arranged over the entire surface of the alumina ceramic base 12. When a voltage is applied to the heater electrode 14, the heater electrode 14 generates heat, and heats a wafer W. This heater electrode 14 contains TiSi2 as a main component.
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