Process chamber apparatus, systems, and methods for controlling a gas flow pattern
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United States of America Patent
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Dec 27, 2016
Grant Date -
May 28, 2015
app pub date -
Nov 26, 2013
filing date -
Nov 26, 2013
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Abstract
Process chamber gas flow control apparatus may include, or be included in, a process chamber configured to process a substrate therein. The gas flow control apparatus may include a valve configured to seal an exhaust port in the process chamber. The valve may be moveable in the X, Y, and Z directions relative to the exhaust port to adjust a gas flow pattern (including, e.g., flow rate and/or flow uniformity) within the process chamber. Methods of adjusting a flow of a process gas within a process chamber are also provided, as are other aspects.
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