193nm laser and inspection system
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United States of America Patent
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Dec 27, 2016
Grant Date -
Aug 14, 2014
app pub date -
Jan 31, 2014
filing date -
Feb 13, 2013
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Abstract
An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
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