Micropattern generation with pulsed laser diffraction
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United States of America Patent
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Dec 27, 2016
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Sep 3, 2013
filing date -
Jan 27, 2012
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Abstract
Methods and devices for preparing microscale polymer relief structures from a thin polymer layer on an absorbing substrate are described. The described methods are ultrafast (about 8 nanoseconds) and allow formation of patterned microstructures having complex morphologies and narrow line widths that are an order of magnitude smaller than the masks used in the methods.
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