Ion implantation machine presenting increased productivity

United States of America Patent

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Dec 20, 2016
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Mar 10, 2016
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Apr 9, 2014
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Apr 11, 2013

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The present invention relates to an ion implantation machine 100 that comprises:

an enclosure 101 that is connected to a pump device 102; a plasma source 115-121-122; a bias power supply 113; a gas inlet 117 leading into the enclosure; anda substrate-carrier 104 connected to the negative pole of the bias power supply and arranged inside the enclosure.

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Patent Owner	Address
ION BEAM SERVICES	ZI PEYNIER-ROUSSET RUE GASTON IMBERT PROLONGÉE PEYNIER F-13790

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Inventor Name	Address	# of filed Patents	Total Citations
Roux, Laurent	Marseilles, FR	28	46
Torregrosa, Frank	Simiane, FR	16	28

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Ion implantation machine presenting increased productivity

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United States of America Patent

14783296

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PATENT NO	9524853
APP PUB NO	20160071695A1
SERIAL NO	14783296
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 20, 2016	US,9524853,B2 US9524853B2	GRANTED PATENT AS SECOND PUBLICATION
March 10, 2016	US,20160071695,A1 US20160071695A1	FIRST PUBLISHED PATENT APPLICATION

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14783296

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