Composition for forming P-type diffusion layer, method of forming P-type diffusion layer, and method of producing photovoltaic cell

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United States of America Patent

PATENT NO 9520529
APP PUB NO 20140065761A1
SERIAL NO

14076212

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Abstract

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The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.

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Patent Owner(s)

Patent OwnerAddress
HITACHI CHEMICAL CO LTDTOKYO JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Shuichiro Tsukuba, JP 25 58
Iwamuro, Mitsunori Tsukuba, JP 35 194
Kizawa, Keiko Tsukuba, JP 22 167
Machii, Yoichi Tsukuba, JP 13 26
Nojiri, Takeshi Tsukuba, JP 67 303
Okaniwa, Kaoru Tsukuba, JP 40 200
Sato, Tetsuya Tsukuba, JP 221 1885
Yoshida, Masato Tsukuba, JP 214 2996

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