Ion implantation apparatus

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United States of America Patent

PATENT NO 9520265
APP PUB NO 20150155129A1
SERIAL NO

14558187

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Abstract

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A multistage quadrupole lens system in an ion implantation apparatus includes a first quadrupole lens and a third quadrupole lens. A first bore radius of the first quadrupole lens may be smaller than a third bore radius of the third quadrupole lens. The multistage quadrupole lens system may further include a second quadrupole lens placed between the first quadrupole lens and the third quadrupole lens. A second bore radius of the second quadrupole lens may take a value lying between the first bore radius of the first quadrupole lens and the third bore radius of the third quadrupole lens (i.e., an intermediate value between them).

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO LTD1-1 OSAKI 2-CHOME SHINAGAWA-KU TOKYO 141-6025

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yagita, Takanori Ehime, JP 18 106

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