Positive photosensitive resin compositions

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9519216
APP PUB NO 20090197067A1
SERIAL NO

12363492

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Abstract

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The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM ELECTRONIC MATERIALS U S A INC80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Naiini, Ahmad A East Greenwich, US 36 254
Racicot, Donald W Providence, US 2 35
Rushkin, Il'ya Walpole, US 7 59
Weber, William D East Providence, US 26 328

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