Method and system for cleaning photomasks
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United States of America Patent
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Dec 13, 2016
Grant Date -
May 22, 2014
app pub date -
Feb 8, 2013
filing date -
Nov 19, 2012
priority date (Note) -
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Abstract
A method for cleaning photomasks includes the following steps: provided a cleansing device having a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is use to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. As least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination. The instant disclosure also provides a system for cleaning photomasks.
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