Baffle and substrate treating apparatuses including the same
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United States of America Patent
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Dec 6, 2016
Grant Date -
Jan 31, 2013
app pub date -
Jul 25, 2012
filing date -
Jul 25, 2011
priority date (Note) -
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Abstract
Provided is a substrate treating apparatus, which includes a plasma generating part configured to generate plasma, a housing disposed under the plasma generating part, and having a space therein, a susceptor disposed within the housing and supporting a substrate, and a baffle including injection holes injecting the plasma supplied from the plasma generating part, to the substrate. The baffle includes a base in which the injection holes are formed, and a central portion of the base is thicker than an edge thereof.
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