Method of detecting photolithographic hotspots

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United States of America Patent

PATENT NO 9508138
APP PUB NO 20160321793A1
SERIAL NO

14742717

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Abstract

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A method for detecting photolithographic hotspots is disclosed. After receiving layout data, an aerial image simulation is conducted to extract aerial image intensity indices. Based on the combination of one or more aerial image intensity indices, various aerial image detectors are generated. The value of aerial image detectors is verified to determine the position and type of the photolithographic hotspots.

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Patent Owner(s)

Patent OwnerAddress
POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATIONNO 18 LI-HSIN RD 1 HSINCHU SCIENCE PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Yi-Shiang Changhua County, TW 6 19
Lai, Jun-Cheng Hsin-Chu, TW 6 13
Lin, Chia-Chi Hsinchu County, TW 48 407
Shih, Pei-Shan Kaohsiung, TW 1 1
Yeh, Shin-Shing Hsinchu, TW 2 1

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