Implant with high vapor pressure medium
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United States of America Patent
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Nov 22, 2016
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app pub date -
Nov 25, 2013
filing date -
Apr 14, 2000
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Abstract
An implant for use in a human or animal body can include a flexible housing with an outer wall and having a chamber therein. The implant can have at least one high vapor pressure medium within the chamber. The at least one high vapor pressure medium can have a combined vapor pressure equal to or greater than about the average value of the hydrostatic pressure of the implantation site plus the skin tension of the housing minus the gas tension of the dissolved gasses present at the implantation site.
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