Method for forming dendritic silver with periodic structure as light-trapping layer
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United States of America Patent
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Nov 15, 2016
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Apr 7, 2016
app pub date -
Feb 3, 2015
filing date -
Oct 7, 2014
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Abstract
The invention is related to a method for forming dendritic silver with periodic structure as light-trapping layer, includes these steps: form a photoresist layer on a conductive substrate, and at least two coherent light beams is provided in using a laser interference lithography apparatus, to form a plurality of particular patterns respectively on the setting-exposure positions of the conductive substrate in sequence till the particular periods pattern formed. Thereafter, form the dendritic silver nanostructure with period pattern on the conductive substrate via electrochemical process, wherein operating voltage is 2V or higher, and electrochemical reaction time is 10 sec or higher.
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