Processing station for planar substrates and method for processing planar substrates
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United States of America Patent
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Nov 1, 2016
Grant Date -
Jan 29, 2015
app pub date -
Feb 25, 2013
filing date -
Mar 30, 2012
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Abstract
A processing station for two-dimensional substrates including at least two processing units and at least two conveyor lines for substrates arranged in parallel to another, wherein both the processing units are placed between the two conveyor lines, and an arrangement for moving the substrates from the conveyor lines to the processing units and back is provided. The arrangement includes four linear conveyor units each having at least one substrate support, wherein a first linear conveyor unit leads from the second conveyor line to the first processing unit, a second linear conveyor unit leads from the first conveyor line to the first processing unit, a third linear conveyor unit leads from the first conveyor line to the second processing unit, and a fourth linear conveyor unit leads from the second conveyor line to the second processing unit.
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