Photoresist compositions and methods of forming photolithographic patterns
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United States of America Patent
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Nov 1, 2016
Grant Date -
Apr 21, 2016
app pub date -
Oct 22, 2015
filing date -
May 31, 2010
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Abstract
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
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