Low magnetic chemical mechanical polishing conditioner
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United States of America Patent
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Oct 25, 2016
Grant Date -
Jun 25, 2015
app pub date -
Dec 4, 2014
filing date -
Dec 20, 2013
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Abstract
The present invention relates to a low magnetic chemical mechanical polishing conditioner and a method for producing the same. The method comprises: providing a substrate; providing a bonding layer disposed on the substrate; and providing a plurality of abrasive particles placed on the bonding layer, and the abrasive particles are placed on the substrate by the bonding layer; wherein the abrasive particles are screened into a non-magnetic content or a low magnetic content through a magnetic separation device. Therefore, the abrasive particles used in the low magnetic chemical mechanical polishing conditioner of the present invention are non-magnetic abrasive particles perfectly to avoid influence of polishing performance due to magnetic abrasive particles.
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