Photoresist composition and associated method of forming an electronic device

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United States of America Patent

PATENT NO 9470976
APP PUB NO 20160103391A1
SERIAL NO

14833278

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Abstract

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A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

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Patent Owner(s)

  • ROHM AND HAAS ELECTRONIC MATERIALS LLC

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cameron, James F Brookline, US 111 1077
Coley, Suzanne M Mansfield, US 31 157
Jain, Vipul North Grafton, US 92 705
Kwok, Amy M Shrewsbury, US 9 63
LaBeaume, Paul J Auburn, US 36 197
Thackeray, James W Braintree, US 102 1785
Valeri, David A Leominster, US 8 56

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