Reflective optical element
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United States of America Patent
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Oct 18, 2016
Grant Date -
Apr 30, 2015
app pub date -
Oct 30, 2014
filing date -
Oct 30, 2013
priority date (Note) -
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Abstract
A reflective optical element for a microlithographic projection exposure apparatus, a mask inspection apparatus or the like. The reflective optical element has an optically effective surface, an element substrate (12, 32, 42, 52), a reflection layer system (14, 34, 44, 54) and at least one deformation reduction layer (15, 35, 45, 55, 58). When the optically effective surface (11, 31, 41, 51) is irradiated with electromagnetic radiation, a maximum deformation level of the reflection layer system is reduced in comparison with a deformation level of an analogously constructed reflective optical element without the deformation reduction layer.
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