Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

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United States of America Patent

PATENT NO 9469705
APP PUB NO 20160102157A1
SERIAL NO

14833245

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Abstract

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A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

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Patent Owner(s)

  • ROHM AND HAAS ELECTRONIC MATERIALS LLC

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cameron, James F Brookline, US 111 1077
Coley, Suzanne M Mansfield, US 31 157
Jain, Vipul North Grafton, US 92 705
Kwok, Amy M Shrewsbury, US 9 63
LaBeaume, Paul J Auburn, US 36 197
Thackeray, James W Braintree, US 102 1785
Valeri, David A Leominster, US 8 56

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