Cathode arrangement, electron gun, and lithography system comprising such electron gun
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United States of America Patent
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Oct 11, 2016
Grant Date -
Jul 2, 2015
app pub date -
Dec 22, 2014
filing date -
Dec 30, 2013
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Abstract
The invention relates to a cathode arrangement comprising:
- a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter;a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position,and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.
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