Lamination method and lamination system

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United States of America Patent

PATENT NO 9460910
APP PUB NO 20140053974A1
SERIAL NO

13972338

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Importance

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Abstract

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To provide a lamination method and a lamination system capable of excellently laminating a film-type laminate without damage even though the semiconductor is a brittle lamination target such as a foil-type semiconductor or a semiconductor made of highly brittle material. In a lamination method for laminating a film-type laminate to a brittle lamination target by overlapping the brittle lamination target and the film-type laminate and heating and pressing the brittle lamination target and the film-type laminate, with respect to the brittle lamination target mounted on a mount member and carried into a lamination device, an elastic film member is expanded into a vacuum chamber of the lamination device from the above to press and laminate the brittle lamination target and the film-type laminate.

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Patent Owner(s)

Patent OwnerAddress
THE JAPAN STEEL WORKS LTDTOKYO JAPAN TOKYO METROPOLIS

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirose, Tomoaki Ohbu, JP 3 4
Okano, Atsushi Nagoya, JP 3 16
Tajima, Hisanaga Inazawa, JP 3 2
Yamamoto, Takayuki Tokoname, JP 332 3494

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