Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

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United States of America Patent

PATENT NO 9459531
APP PUB NO 20150284492A1
SERIAL NO

14744963

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Abstract

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There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takizawa, Hiroo Shizuoka, JP 119 1001
Tsubaki, Hideaki Shizuoka, JP 101 2182
Yokokawa, Natsumi Shizuoka, JP 28 128

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