Method and devices for controlling a vapour flow in vacuum evaporation
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 4, 2016
Issued Date -
N/A
app pub date -
Dec 22, 2008
filing date -
Dec 21, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention relates to a method and a device for the coating of running substrates (25) moving along a run direction through a treatment zone (6), in which the vapor of a coating material is generated in a chamber (5), this vapor passing through a treatment aperture towards the treatment zone (6) where the coating material condenses on the surface of the substrates (25). The vapor flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter (13), between an open position, in which said vapor flows through the treatment aperture towards the treatment zone (6), and a closed position, in which the vapor is prevented from flowing towards the treatment zone (6) through the treatment aperture.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully