Polymer composition and method for removing contaminates from a substrate
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United States of America Patent
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Oct 4, 2016
Grant Date -
May 17, 2012
app pub date -
Feb 28, 2007
filing date -
Feb 28, 2006
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Abstract
This invention relates to an aqueous polymer composition and to films formed from this aqueous composition. The aqueous composition may be used in a method for removing contaminate material from a substrate. The aqueous polymer composition may comprise: water; and at least one water-soluble film forming polymer. In one embodiment, the aqueous composition may further comprise at least one chelating agent and/or at least one surfactant. The aqueous polymer composition may be applied to a contaminated substrate or to a clean substrate which is subjected to subsequent contamination. The aqueous composition may be dehydrated and/or the polymer may be crosslinked to form a film. When applied to a contaminated substrate, the film may combine with the contaminates. When applied to a clean substrate, the contaminate material may subsequently contact and adhere to the film. The film combined with the contaminate material may be separated from the substrate, with the result being removal of the contaminate material from the substrate.
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