Photomask blank and photomask for suppressing heat absorption

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United States of America Patent

PATENT NO 9454073
APP PUB NO 20150227040A1
SERIAL NO

14550847

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Abstract

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A photomask blank and/or photomask includes a light transmitting substrate, a highly reflective material layer disposed on the light transmitting substrate, and a transfer pattern layer disposed on the highly reflective material layer. The highly reflective material layer reflects light to be transmitted through the light transmitting substrate, with a predetermined reflectivity.

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Patent Owner(s)

Patent OwnerAddress
SK HYNIX INCGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ha, Tae Joong Daejeon, KR 19 23

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