Fabrication of seamless large area master templates for imprint lithography using step and repeat tools

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United States of America Patent

PATENT NO 9452574
APP PUB NO 20130153534A1
SERIAL NO

13720315

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Abstract

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Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.

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Patent Owner(s)

Patent OwnerAddress
CITIBANK N A388 GREENWICH STREET NEW YORK NY 10013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miller, Michael N Austin, US 48 790
Resnick, Douglas J Leander, US 42 457
Xu, Frank Y Round Rock, US 174 2481

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