High-frequency power supply device, and plasma ignition method
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United States of America Patent
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Sep 20, 2016
Grant Date -
Jun 9, 2016
app pub date -
Mar 12, 2014
filing date -
Feb 4, 2014
priority date (Note) -
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Abstract
A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse. Since the ignition pulse is configured as including the main pulse and the prepulse, this enables protection of a high-frequency power source against reflected wave power, as well as reliably igniting the plasma.
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