Fan-out wafer level package and manufacturing method thereof
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 20, 2016
Grant Date -
N/A
app pub date -
Jul 16, 2015
filing date -
Jun 5, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Provided are a wafer level package and a manufacturing method thereof. The wafer level package method includes preparing a patterned wafer, forming a recess in a position, in which a semiconductor chip is to be attached, of the patterned wafer through an etching process, fixing the semiconductor chip to the interior of the recess, and applying a passivation material to portions other than the semiconductor chip within the recess and to an upper end of the wafer. The wafer level package includes a silicon or glass wafer including a recess formed through etching and having an area larger than a semiconductor chip, a semiconductor chip fixed to the interior of the recess, and a passivation material filling an empty space other than the semiconductor chip within the recess and applied to a portion corresponding to an area larger than the semiconductor chip on an upper end of the wafer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully