Exposure method, exposure apparatus, and method for producing device

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United States of America Patent

PATENT NO 9448493
APP PUB NO 20130182232A1
SERIAL NO

13788940

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Abstract

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An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.

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Patent Owner(s)

  • NIKON CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirukawa, Shigeru Tokyo, JP 94 4026

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