Determining a state of a high aspect ratio hole using measurement results from an electrostatic measurement device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 20, 2016
Grant Date -
Dec 17, 2015
app pub date -
May 21, 2015
filing date -
Jun 12, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully