High brightness X-ray absorption spectroscopy system

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United States of America Patent

PATENT NO 9448190
SERIAL NO

14636994

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Abstract

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This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

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SIGRAY INC5750 IMHOFF DRIVE SUITE I CONCORD CA 94520

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kirz, Janos Berkeley, US 51 1475
Lewis, Sylvia Jia Yun San Francisco, US 45 1447
Yun, Wenbing Walnut Creek, US 99 3901

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