Ion implantation system and process for ultrasensitive determination of target isotopes

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United States of America Patent

PATENT NO 9443708
APP PUB NO 20160071713A1
SERIAL NO

14482332

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Abstract

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A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.

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Patent Owner(s)

Patent OwnerAddress
BATTELLE MEMORIAL INSTITUTE902 BATTELLE BOULEVARD RICHLAND WA 99354

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Farmer,, III Orville T Kennewick, US 2 8
Liezers, Martin Richland, US 5 23

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