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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
AP SYSTEMS INC	15-5 LANE 8 DONGTAN CHAN TUAN HWASEONG CITY GYEONGGI PROVINCE SOUTH KOREA (POSTAL CODE 18487) HWASEONG GYEONGGI-DO

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• F27B:FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPE....

• 2013 Application Filing Year
• H01L Class
• 22267 Applications Filed
• 20713 Patents Issued To-Date
• 93.03 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Kim, Chang-Kyo	Hwaseong-Si, KR	2	41
# of filed Patents : 2 Total Citations : 41
Kim, Ki-Nam	Osan-Si, KR	142	1980
# of filed Patents : 142 Total Citations : 1980
Kim, Sung-Chul	Hwaseong-Si, KR	121	1790
# of filed Patents : 121 Total Citations : 1790
Kwon, Chang-Min	Osan-Si, KR	3	0
# of filed Patents : 3 Total Citations : 0

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Patent Citation Ranking

• 0 Citation Count
• H01L Class

• 0 % this patent is cited more than
• 9 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 29, 2028

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 30, 2016	US,9431279,B2   US9431279B2	GRANTED PATENT AS SECOND PUBLICATION
November 21, 2013	US,20130308928,A1   US20130308928A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9431279

Heater block and a substrate treatment apparatus

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Abstract

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The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.

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Description

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Claims

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Claims data not available

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Legal Events

 

• MAFP2024
• MAFP2020
• I2016
• STCF2016
• P2013
• F2013
• AS2013
• PD2012

Date	Code	Event	Description
Feb 14, 2024	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 8TH YR, SMALL ENTITY (ORIGINAL EVENT CODE: M2552); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY year of fee payment: 8
Feb 13, 2020	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 4TH YR, SMALL ENTITY (ORIGINAL EVENT CODE: M2551); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY year of fee payment: 4
Aug 30, 2016	I	Issuance
Aug 10, 2016	STCF	INFORMATION ON STATUS: PATENT GRANT	free format text: PATENTED CASE
Nov 21, 2013	P	Published
May 15, 2013	F	Filing
Apr 25, 2013	AS	ASSIGNMENT	free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KIM, CHANG-KYO;KIM, SUNG-CHUL;KWON, CHANG-MIN;AND OTHERS;REEL/FRAME:030427/0150 Owner name: AP SYSTEMS INC., KOREA, REPUBLIC OF Effective Date: Apr 25, 2013
May 18, 2012	PD	Priority Date