Method for polishing work and work polishing apparatus
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United States of America Patent
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Aug 30, 2016
Grant Date -
Sep 17, 2015
app pub date -
Mar 4, 2015
filing date -
Mar 14, 2014
priority date (Note) -
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Abstract
The method of the present invention is capable of polishing a high hardness work at high polishing efficiency. The method comprises the steps of: pressing a surface of the work onto a polishing part of a rotating polishing plate; and supplying slurry while performing the pressing step. The method is characterized in that an activated gas, which has been activated by gas discharge, is turned into bubbles and mixed into the slurry.
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