Process chamber gas flow apparatus, systems, and methods
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United States of America Patent
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Aug 30, 2016
Grant Date -
Jun 5, 2014
app pub date -
Nov 26, 2013
filing date -
Nov 30, 2012
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Abstract
Process chamber gas flow control apparatus having a tiltable valve are disclosed. The gas flow apparatus includes a process chamber adapted to contain a substrate, an exit from the process chamber including a valve seat, and a tiltable valve configured and adapted to tilt relative to the valve seat to control flow non-uniformities within the process chamber. Systems and methods including the tiltable valve apparatus are disclosed, as are numerous other aspects.
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