Method for producing plasma flow, method for plasma processing, apparatus for producing plasma, and apparatus for plasma processing
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United States of America Patent
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Aug 23, 2016
Grant Date -
Feb 7, 2013
app pub date -
Apr 20, 2011
filing date -
Apr 22, 2010
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Abstract
Provided are a plasma stream generation method, a plasma processing method, a plasma generation apparatus, and a plasma processing apparatus using same, which enable plasma processing with rotating plasma to be controllably performed with stability and thereby improved in quality. The frequencies in four quadrants Z1-Z4 are set at 7, 15, 6, and 20 Hz, respectively. This frequency variability can realize different rotational velocity of plasma in the four-portion partitioned rotational angle regions. The rotational velocities of plasmas P2, P4 are greater than those of plasmas P1, P3. Thus, the rotating plasma, which rotates at a periodically varied rotational velocity as plasma P1, plasma P2, plasma P3, and plasma P4 in that order while traveling in a circular orbit C, can be used for irradiation therewith, thereby performing uniform film formation treatment in first quadrant Z1 to fourth quadrant Z4.
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