System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing process
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United States of America Patent
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Aug 23, 2016
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N/A
app pub date -
Mar 15, 2013
filing date -
Jun 11, 2012
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Abstract
A system and method for mask data preparation (MDP) uses pixel processing algorithms running on parallel processing platforms such as central processing units (CPUs) and graphical processing units (GPUs). Proximity effects correlation, dose, and bias corrections are performed on a pixel basis. In some embodiments, striping of a decorated database in parallel using multiple graphic processors is performed. While performing a first light path simulation for a first stripe for a mask, a second light path simulation is performed for a second stripe for the mask. Using a result of the striping and first and second light path simulations, dose adjustment during a mask processing on a pixel of the mask is performed.
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