Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9423692
APP PUB NO 20160004159A1
SERIAL NO

14851934

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
DONGJIN SEMICHEM CO LTDINCHON SOUTH KOREA INCHEON

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Man Ho Gyeonggi-do, KR 11 17
Kim, Hyun Jin Gyeonggi-do, KR 272 4698
Kim, Jae Hyun Seoul, KR 259 2059
Park, Jong Kyoung Gyeonggi-do, KR 5 20

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 0 Citation Count
  • C09D Class
  • 0 % this patent is cited more than
  • 9 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges98324511032101 - 1011 - 2021 - 3031 - 4041 - 5061 - 70020406080100120140160180200220240260280300320340360

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
11.5 Year Payment $7400.00 $3700.00 $1850.00 Feb 23, 2028