Vortex diodes as effluent treatment devices

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United States of America Patent

PATENT NO 9422952
APP PUB NO 20140251904A1
SERIAL NO

14351124

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of waste water treatment. The present invention disclose vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduces Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of waste water effectively in effluent treatments.

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Patent Owner(s)

Patent OwnerAddress
COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCHNEW DELHI 110 001

International Classification(s)

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  • 2012 Application Filing Year
  • F15C Class
  • 54 Applications Filed
  • 32 Patents Issued To-Date
  • 59.26 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20122013201420152016201720180255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bhandari, Vinay Manoharrao Maharashtra, IN 3 1
Kulkarni, Amol Arvind Maharashtra, IN 17 14
Ranade, Vivek Vinayak Maharashtra, IN 11 40

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  • 0 Citation Count
  • F15C Class
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  • 9 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3183201 - 1011 - 2021 - 30012345678910111213141516171819

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